Page 5 - IJAMD-2-3
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International Journal of AI for Materials and Design
Editorial Board
Editor-in-Chief Seong Su Kim, South Korea Jeanne Tan, China
Wai Yee Yeong, Singapore Hyunwoong Ko, USA Ehsan Toyserkani, Canada
A. Senthil Kumar, Singapore Man Pun Wan, Singapore
Associate Editors Panagiotis Kyratsis, Greece Pan Wang, Singapore
Shweta Agarwala, Denmark Pascal LORENZ, France Shenghao Wang, China
Dermot Brabazon, Ireland Jay Lee, USA Hao Wang, China
Xiaopeng Li, Australia Dazhong Wu, USA
Editorial Board Weifu Li, China Kentaro Yaji, Japan
Members* Zhong Alan Li, Hong Kong W. Hong Yeo, USA
Antonio Gloria, Italy Kaili Lin, China Jingjie Yeo, USA
Faris M. Al-Oqla, Jordan Xu Long, China Zhen Yuan, China
Jan Akmal, Finland Jianxi Luo, Singapore Y. Shrike Zhang, USA
Mehdi Amiri, USA Dragan Marinkovic, Germany Xing Zhang, China
Ruzena Bajcsy, USA Abbas Milani, Canada Yicha Zhang, France
Valentina E. Balas, Romania Chilukuri K. Mohan, USA Pai Zheng, China
Michail Beliatis, Denmark Seung Ki Moon, Singapore Junxing Zheng, China
Filippo Berto, Italy Nezih Mrad, Canada Hongxiang Zong, China
Ilaria Cacciotti, Italy Tuhin Mukherjee, USA
Yanlong Cao, China Roger Narayan, USA Assistant Editors
Danni Chang, China Tung Nguyen-Dang, Vietnam Nehru Devabharathi, India
Chongdu Cho, Korea Ping Feng Pai, Taiwan (China) Wei Long Ng, Singapore
Alfredo Cuzzocrea, Italy Stefanos Papanikolaou, Poland
Youth Editorial Board
Gianni D'Angelo, Italy Radu-Emil Precup, Romania
Members
Frédéric Demoly, France Seunghwa Ryu, South Korea
Murali Mohan Cheepu, Korea
Shi Xue Dou, Australia Sonal Shreya, Denmark
Zhen Liu, USA
Zhimin Du, China Swee Leong Sing, Singapore
Faeez Masurkar, UAE
Mohammad Elahinia, USA Binyang Song, Singapore
Haoyuan Shi, USA
Gerd Grau, Canada Anil Srivastava, USA
Jinlong Su, Singapore
Qi Gu, China Tino Stankovic, Switzerland
Yutai Su, China
Mohammad Heidari-Rarani, Iran Ephraim Suhir, USA
Bijun Tang, Singapore
Im Doo Jung, South Korea Gyorgy Szekely, Saudi Arabia
César M. A. Vasques, Portugal
*Editorial Board Members as of September 26, 2025
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