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Materials Science in Additive Manufacturing                               Ceramic vat photopolymerization



            editorial and peer-review process conducted for this paper,   technology: Structured catalysts, mixers and reactors.
            directly or indirectly. Other authors declare they have no   Chem Soc Rev. 2018;47(1):209-230.
            competing interests.                                  doi: 10.1039/C7CS00631D

            Author’s contributions                             8.   Choi JW, Kim HC, Wicker R. Multi-material stereolithography.
                                                                  J Mater Process Technol. 2011;211(3):318-328.
            Investigation: Chongyu Long
            Data curation: Chongyu Long                           doi: 10.1016/j.jmatprotec.2010.10.003
            Formal analysis: Chongyu Long                      9.   Klein J, Stern M, Franchin G, et al. Additive manufacturing
            Funding acquisition: Zhangwei Chen                    of optically transparent glass.  3D Print Addit Manuf.
            Investigation: Zhiyuan Liu, Changyong Liu, Zhangwei   2015;2(3):92-105.
               Chen                                               doi: 10.1089/3dp.2015.0021
            Resources: Zhangwei Chen                           10.  Halloran  JW. Ceramic stereolithography: Additive
            Supervision: Zhangwei Chen                            manufacturing for ceramics by photopolymerization. Annu
            Visualization: Chongyu Long                           Rev Mater Res. 2016;46(1):19-40.
            Writing–original draft: Chongyu Long, Zhangwei Chen
            Writing–review & editing: All authors                 doi: 10.1146/annurev-matsci-070115-031841
                                                               11.  Griffith ML, Halloran JW. Ultraviolet curable ceramic
            Ethics approval and consent to participate            suspensions for stereolithography of ceramics. In:
            Not applicable.                                       Proceedings Solid Freeform Fabrication Symposium; 1994.
                                                                  p. 529-534.
            Consent for publication                            12.  Nakamoto T, Yamaguchi K. Consideration on the Producing
                                                                  of High Aspect Ratio Micro Parts using UV Sensitive
            Not applicable.
                                                                  Photopolymer. United States: IEEE; 1996. p. 53-58.
            Availability of data                               13.  Bertsch A, Zissi S, Jezequel J, Corbel S, Andre J.
                                                                  Microstereophotolithography using a  liquid  crystal
            Not applicable.                                       display as dynamic mask-generator.  Microsyst Technol.

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            Volume 4 Issue 3 (2025)                         17                        doi: 10.36922/MSAM025200031
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