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Sandra Sánchez-Salcedo, Montserrat Colilla, Isabel Izquierdo-Barba, et al.

Figure 2. (A) E. coli adhesion onto 3D HA scaffolds (3D-HA) before and after being submitted to the zwitterionization process with
3-aminopropyltrimethoxysilane (APTES) and carboxyethyl silanetriol sodium salt (CES) (3D-HA-Zwitter). Schematic representation
of the performance of 3D-HA-Zwitter surface during the bacterial adhesion assay was also included. (B) SEM micrographs at 1000x
magnification of the surface of 3D-HA and 3D-HA-Zwitter scaffolds after 24 hours of cell spreading assay with the HOS osteoblast
culture.

adhesion and proliferation can be explained by a ma- tures are the atomic self-shadowing mechanism at the
thematical model [63] . Recently, MS-GLAD has been surface and the collisional processes of the sputtered
used to produce nanostructured coatings in pure tita- atoms in the plasma phase, mediated by the tilt angle
nium and Ti6Al4V alloy implants [24] . MSGLAD is a of the substrate and the value of the argon background
powerful technique for producing nanostructured coa- pressure [65] .
tings in large areas and with a great variety of mor- Figure 3A indicated SEM micrographs correspond-
phologies [64] . It is based on exploiting atomic sha- ing to Ti6Al4V substrates before and after (Na-
dowing effects during physical vapor deposition under no-Ti6Al4V) MSGLAD processing, displaying dif-
high vacuum conditions. In this sense, the main pro- ferent topological surface features. Nano-Ti6Al4V
cesses responsible for the formation of the nanostruc- substrate appeared fully coated, with patterns at the

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