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Materials Science in Additive Manufacturing                 In situ electromagnetic field manipulation during LMD


            600 #, 1200 #, and 4000 # sandpaper in turn) and polished   were  tested for each  sample  (Figure  2E).  The  distance
            using OPS (SiO  suspension) with 40% H O  as volume   between each test point was 0.4  mm, and the selected
                         2
                                               2
                                                 2
            fraction. Before the microstructure characterization,   position of the highest point was 0.4 mm from the top of
            the sample was immersed in an etchant solution     the deposition layer.
            (V :HNO :H O=3:5:92) for 60 – 70 s. The microstructure
                       2
                    3
              HF
            characterization was conducted using a scanning electron   3. Results and discussion
            microscope (JSM-IT800, HL; Japan). The upper (U), middle   3.1. Morphological analysis of the molten pool
            (M),  and  bottom  (B)  areas  of  the  deposition  layer  were
            selected for microstructure characterization (Figure 2C).   Figure  3 displays the molten pool morphology of the
            Texture analysis was conducted via electron backscattering   deposition layer with different electromagnetic parameters.
            diffraction (EBSD). The electrolytic polishing of samples   The deposition layer comprises a molten pool and a heat-
            was performed using 5% perchloric acid solution for 13 –   affected area. The solid yellow line delineates the boundary
            15 s after mechanical polishing but before the EBSD test,   between the molten pool and the heat-affected area, while
            with a scan area of 1.5 × 1.5 mm (Figure 2D).      the dashed yellow line indicates the boundary between
                                                               the heat-affected area and the substrate. As displayed in
              The hardness of the cross-section of the deposition   Figure 3A-D, the area (including height, width, and melt
            layer was determined using a Vickers hardness tester   depth) of the deposition layer in samples EM-1 to EM-3
            (Hua Yin HV-1000A; China). The hardness test points   is reduced significantly. The coarse columnar grain can
            were selected in the form of a 5 × 10 matrix, and 50 points   be observed in sample EM-0 (Figure 3A); reduced grain
                                                               size and equiaxed grains can be observed in sample EM-1
            Table 2. Chemical composition of Ti-6Al-4V powder  (Figure  3B). The long columnar grain in sample EM-2
                                                               appears plate-like (Figure 3C), whereas coarse grains are
            Element  Ti    Al   V   Fe   C   N    O    H       observed in sample EM-3 (Figure 3D) with the increase in
            Wt%      Balance  6.2  4.15 0.056 0.01 0.015 0.15 0.0016  electromagnetic intensity.

                                                                 As depicted in Table 4, the width, height, and melt depth
            Table 3. Sample number and electromagnetic parameters  of the deposition layers in sample EM-0 are 1.16, 4.11, and
            Sample      Voltage     Current      Magnetic      0.77  mm, respectively. Under the electromagnetic field,
            number        (V)        (A)       intensity (mT)  the area of sample EM-1 is the smallest, with a length,
            EM-0           0          0             0          width, and height of 0.92, 3.46, and 0.75 mm, respectively.
            EM-1           8          20           39.40       This could be due to inhibition of the molten pool flow
                                                               due to the electromagnetic field that results in a reduction
            EM-2          12          30           57.12       in the flow of high-temperature melt toward the periphery
            EM-3          16          40           72.93       from the center of the laser beam; subsequently, the size


                         A                                   B











                         C                                   D











            Figure 3. The optical microscopic image of deposition layers of different samples: (A) EM-0; (B) EM-1; (C) EM-2; and (D) EM-3. Scale bars: 500 µm


            Volume 4 Issue 1 (2025)                         7                              doi: 10.36922/msam.8332
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